Thermal oxidation of reactively sputtered amorphous W80N20films
نویسندگان
چکیده
منابع مشابه
Decomposition and nanocrystallization in reactively sputtered amorphous Ta–Si–N thin films
The nanocrystallization process of reactively sputtered thin amorphous Ta–Si–N films is investigated by anomalous small angle x-ray scattering ~ASAXS! and x-ray diffraction ~XRD!. Changes in the microstructure in Ta40Si14N46 films, density variations in the amorphous matrix, decomposition, formation, and growth of nanocrystals after vacuum anneals at different temperatures in the range between ...
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ژورنال
عنوان ژورنال: Journal of Applied Physics
سال: 1990
ISSN: 0021-8979,1089-7550
DOI: 10.1063/1.346863